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Planar Channeling of 855 MeV Electrons in Silicon: Monte-Carlo Simulations

机译:硅中855 meV电子的平面沟道:monte-Carlo   模拟

摘要

A new Monte Carlo code for the simulation of the channeling ofultrarelativistic charged projectiles in single crystals is presented. Adetailed description of the underlying physical model and the computationalgorithm is given. First results obtained with the code for the channeling of855 MeV electrons in Silicon crystal are presented. The dechanneling lengthsfor (100), (110) and (111) crystallographic planes are estimated. In order toverify the code, the dependence of the intensity of the channeling radiation onthe crystal dimension along the beam direction is calculated. A good agreementof the obtained results with recent experimental data is observed.
机译:提出了一种新的蒙特卡洛代码,用于模拟单向超电性带电射弹的通道。给出了基础物理模型和计算算法的详细描述。给出了用855 MeV电子在硅晶体中沟道的代码获得的第一个结果。估计(100),(110)和(111)晶面的去沟道长度。为了验证代码,计算了沿束方向的通道辐射强度对晶体尺寸的依赖性。观察到所得结果与最近的实验数据有很好的一致性。

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